SKC (CEO: Park Jang Seok) wins high court ruling over a provisional disposition application regarding copyright infringement involving SKC’s new Chemical Mechanical Polishing (CMP) pad business.

Rohm & Hass initially submitted a provisional disposition application in order to cease copyright infringements on patents it owned to the Suwon District Court on January 4, 2005. On September 22nd of the same year, Rohm & Hass’s provisional disposition application was dismissed by the district court, and Rohm & Hass immediately filed an appeal to the Seoul High Court. The high court ruled that “SKC’s CMP Pads do not infringe on the patents owned by Rohm & Hass,” and dismissed the lawsuit on September 11, 2006.

Chemical-mechanical polishing (CMP) is a technique used in semiconductor fabrication for planarizing the top surface of a semiconductor wafer. After a multi-year research effort, SKC succeeded in developing a proprietary CMP pad and began supplying it to domestic semiconductor firms since 2004. Furthermore, SKC’s CMP pads have received quality certification from domestic semiconductor firms. Currently, SKC has several patents pending in Korea and other countries regarding CMP pad-related technology.